Probing the Nature of Interfacial States in NO Passivated 4H-SiC/SiO$_\sf{2}$ Structures using TEM-EELS and XPS


Date
Dec 2, 2015
Location
Boston, MA
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Joshua Taillon
Materials Data Scientist

A materials research scientist at NIST interested in scientific data curation, AI for materials research, and baking bread.

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